| 1. |
|
First the metal sheet (thickness from 5 µm up to 2 mm) is degreased and activated. |
| 2. |
|
Next a photo- sensitive resist is applied to both sides. |
| 3. |
|
This laminated sheet is exposed to a photo tool on one or both sides. |
| 4. |
|
The resist is then developed with the non-exposed areas being removed for a negative resist. |
| 5. |
|
The sheet can now be etched. |
| 6. |
|
Finally the remaining resist is removed; the product is now ready for further handling. |
